Speaker
Alex Lee (李明利), Department Manager, TSMC
Alex Lee (李明利), Department Manager, TSMC
Topic
The Development of TSMC Exhaust Treatment Technology
台積電廢氣處理技術發展現況
Abstract
With the progress of semiconductor process, the chemicals used in advanced process increase exponentially in types and in amount. Therefore at the time of moving forward to advanced technology, how to properly manage air pollution and to overcome the obstacles of current air pollution treatment technology is a challenge for high-tech facilities.
TSMC will share in the seminar the development and application experience of air pollution treatment, focusing on the air pollution issues related to advanced process, analyze the treatment technologies and the implementation results of TSMC engineering teams for the past few years. With the collaboration of industry, academia and R&D institution, we look forward to driving the development of innovative technologies in a phased manner, for achieving our ultimate goal of clean production.
隨著半導體製程的演進，在先進製程所使用的化學品，不管在種類或用量上，都呈現倍數的增加。因此在邁向先進技術的同時，如何妥善處理先進製程所產生的空污問題，突破既有空污處理技術的瓶頸，是高科技廠務設施必須克服的挑戰。
本研討會；台積電將報告在空污處理技術的發展及應用經驗，對於先進製程所衍生的空污問題，分析過去幾年台積電工程團隊開發的處理技術及應用成效，希望能夠透過產學研單位的共同努力，以階段性的目標去驅動新技術開發，實現清潔生產概念的積極目標。
The Development of TSMC Exhaust Treatment Technology
台積電廢氣處理技術發展現況
Abstract
With the progress of semiconductor process, the chemicals used in advanced process increase exponentially in types and in amount. Therefore at the time of moving forward to advanced technology, how to properly manage air pollution and to overcome the obstacles of current air pollution treatment technology is a challenge for high-tech facilities.
TSMC will share in the seminar the development and application experience of air pollution treatment, focusing on the air pollution issues related to advanced process, analyze the treatment technologies and the implementation results of TSMC engineering teams for the past few years. With the collaboration of industry, academia and R&D institution, we look forward to driving the development of innovative technologies in a phased manner, for achieving our ultimate goal of clean production.
隨著半導體製程的演進，在先進製程所使用的化學品，不管在種類或用量上，都呈現倍數的增加。因此在邁向先進技術的同時，如何妥善處理先進製程所產生的空污問題，突破既有空污處理技術的瓶頸，是高科技廠務設施必須克服的挑戰。
本研討會；台積電將報告在空污處理技術的發展及應用經驗，對於先進製程所衍生的空污問題，分析過去幾年台積電工程團隊開發的處理技術及應用成效，希望能夠透過產學研單位的共同努力，以階段性的目標去驅動新技術開發，實現清潔生產概念的積極目標。